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PL
Photoluminescence mapping system
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C-V
Carrier density profiling system
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Sputter
Full-automatic sputtering system for the formation of electrical insulator material, such as SiO2, for optoelectric devices.
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ICP
Dry etching system based on inductively coupled plasma for micro-fine patterns and smooth vertical walls of lightwave integrated circuits and optical devices.
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EB Evaporation
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Oxidation
Self-designed AlAs selective oxidation system for fabricating current confinement in VCSELs.
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Photo-lithography
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Robonano
NC machine for nano-scale structure fabrication using lathe with five super precision axes.
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FIB
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Ellipsometer
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AFM
Atomic force scanning microscope (AFM) for observing quantum dots, epitaxial surface and micro-apertures.
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SEM
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VCSEL measurement
Laser characterization system for 2-dimensional VCSEL array.
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BER
High speed (up to 40Gb/sec) bit error rate measuring system for lightwave communication.
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Optical network analyzer
The optical network analyzer is used for measuring chromatic dispersion of an optical filter and a dispersion compensator consisting of a waveguide, dielectric multilayer, and so on.
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Copyright (C) 2011 Koyama, Uenohara, Miyamoto Lab. All rights reserved.