Research Facilities
PL

Photoluminescence mapping system
C-V

Carrier density profiling system
Sputter

Full-automatic sputtering system for the formation of electrical insulator material, such as SiO2, for optoelectric devices.
ICP

Dry etching system based on inductively coupled plasma for micro-fine patterns and smooth vertical walls of lightwave integrated circuits and optical devices.
EB Evaporation

Oxidation

Self-designed AlAs selective oxidation system for fabricating current confinement in VCSELs.
Photo-lithography

Robonano

NC machine for nano-scale structure fabrication using lathe with five super precision axes.
FIB

Ellipsometer

AFM

Atomic force scanning microscope (AFM) for observing quantum dots, epitaxial surface and micro-apertures.
SEM

VCSEL measurement

Laser characterization system for 2-dimensional VCSEL array.
BER

High speed (up to 40Gb/sec) bit error rate measuring system for lightwave communication.
Optical network analyzer

The optical network analyzer is used for measuring chromatic dispersion of an optical filter and a dispersion compensator consisting of a waveguide, dielectric multilayer, and so on.

Copyright (C) 2011 Koyama, Uenohara, Miyamoto Lab. All rights reserved.